Photomask plasma etching: a review
WebAbstract. While plasma etching of wafers has been a mainstay of the semiconductor industry for more than 25 years, only in the last decade has dry-etch processing become interesting to mask manufacturers. The reason for the late introduction of this technology becomes obvious when the methodologies used to image silicon wafers are examined. WebFor a photomask, you would typically want about 6,000 – 10,000Ǻ of thickness. Step 4: Pre-Bake. ... Step 9: Cr Etch. After the short plasma “de-scum,” it is time to do the Cr etch. This …
Photomask plasma etching: a review
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WebDec 8, 1995 · Using design-of-experiment methodologies, a chrome plasma etch process (using OCG-895i) was developed. This work proves the feasibility of plasma etching chromium patterns on photomasks. The results show an etch that has excellent uniformity, is anisotropic, and has excellent edge quality. Also, resist selectivity is high for the etching … WebPhotomasks Soda Lime and Fused Silica. A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography. Lithographic photomasks are typically transparent fused silica blanks covered with a pattern defined with a chrome metal-absorbing film. . Photomasks …
WebDec 8, 1995 · Using design-of-experiment methodologies, a chrome plasma etch process (using OCG-895i) was developed. This work proves the feasibility of plasma etching … WebMask Etch. Photomasks are a key element in semiconductor processing because they transfer the integrated circuit patterns to the wafers. Therefore, faithful reproduction of …
WebChromium (Cr) metal is commonly used to make photomasks for lithography it is also used as a hardmask for etching materials such as Silicon Dioxide.It can be etched using … WebMethod for quartz photomask plasma etching US7829243B2 (en) * 2005-01-27: 2010-11-09: Applied Materials, Inc. Method for plasma etching a chromium layer suitable for photomask fabrication ... A New Microwave Plasma Etching System Using Time Modulation Bias Technology, Hitachi Review, 1999, pp. 344-348, vol. 48, No. 6.
Webuser friendly multitasking capabilities of the PlasmaScope makes plasma monitoring and endpoint detection easier for various materials & plasmas conditions. Measurement Photomasks are etched down to reach the Cr/Quartz interface. Cl 2, O 2 and CHF 3 based chemis-try. Open area: from 1 to 100%. Resist Cr Quartz Starting point Cr etching 100 nm ...
WebDec 6, 2004 · Photomask plasma etch reactions were studied using Gibbs energy minimization method. The equilibrium compositions were analyzed at practical photomask plasma etch conditions of temperatures, pressures, and reactant inputs. The thermodynamic calculations were based on common gaseous systems used in photomask plasma … jmg mechanical contractorsWebcritical dimension (CD) change of as much as 0.02 µm. For photomasks, it was determined that a hot plate bake (HPB) of 10 minutes was required at 105 o C to activate the acid … jmg maintenance muswellbrookWebJan 24, 2012 · A soft etch mask (photoresist) was used to pattern the sample wells. Etching was carried out using an O 2:CHF 3 (20:60 sccm) plasma at 100 W RF power and 15 mtorr, giving an etch rate of about 140 nm/min for CYTOP which is around two times larger than the etch rate of the photoresist used (maN-1420, micro resist technology GmbH). Directly … jmg mechanical corpWebPlasma-Therm has been a leading supplier of dry etch systems to the global photomask market for more than 15 years, with the largest installed base for both R&D and production. Extensive experience in this field has resulted in industry technological innovations. Plasma-Therm provides etch solutions for all major photomask technologies ... jmg medical grouphttp://www.plasma-therm.com/photomask.html jmg machine incWebCORIAL solutions. Leveraging our experience in the fields of metals and hard materials processing, CORIAL has been a supplier of cost-effective dry etch systems to the photomask market since 2004. CORIAL provides innovative plasma process solutions for the full range of photomask formats, materials, and technologies, including chrome etching ... jmg motor groupWebJul 1, 2003 · Theoretical and experimental Cr photomask etch studies are carried out using different resists [ZEP, chemically amplified resists (CAR), and optical resists] and different brand etch tools. The effects of chrome loading are analyzed, and theoretical equations are developed for etch time calculations and endpoint determinations of extremely low Cr … jmgmx summary prospectus